Plasma enhanced chemical vapour deposition of silica onto titanium: Analysis of surface chemistry, morphology and hydroxylation

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dc.contributor.authorSzili, Endre
dc.contributor.authorKumar, Sunil
dc.contributor.authorSmart, Roger
dc.contributor.authorLowe, Rachel Davida
dc.contributor.authorSaiz, Eduardo
dc.contributor.authorVoelcker, Nicolas Hans
dc.date.accessioned2010-07-27T05:46:45Z
dc.date.available2010-07-27T05:46:45Z
dc.date.issued2008en_US
dc.identifier.citationSzili, E., Kumar, S., Smart, R., Lowe, R.D., Saiz, E., & Voelcker, N.H., 2008. Plasma enhanced chemical vapour deposition of silica onto titanium: Analysis of surface chemistry, morphology and hydroxylation. Surface Science, 602(14), 2402-2411.en
dc.identifier.doihttps://doi.org/10.1016/j.susc.2008.05.027en
dc.identifier.issn0039-6028en_US
dc.identifier.rmid2006009061en_US
dc.identifier.urihttp://hdl.handle.net/2328/8786
dc.subject.forgroup0204 Condensed Matter Physicsen_US
dc.subject.forgroup0206 Quantum Physicsen_US
dc.subject.forgroup0306 Physical Chemistry (incl. Structuralen_US
dc.subject.forgroup0399 Other Chemical Sciencesen_US
dc.titlePlasma enhanced chemical vapour deposition of silica onto titanium: Analysis of surface chemistry, morphology and hydroxylationen_US
dc.typeArticleen_US
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0399 - Other Chemical Sciences